Takahiro Mori

Work

National Institute of Advanced Industrial Science and Technology (AIST)
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Researcher

Japan

National Institute of Advanced Industrial Science and Technology
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Postdoctoral Researcher

Japan

RIKEN
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Postdoctoral Researcher

Japan

Education

Tohoku Univeristy
Japan

Doctor

Tohoku Univerisity
Japan

Master

Tohoku University
Japan

Bachelor

Publications

Process and device integration for silicon tunnel FETs utilizing isoelectronic trap technology to enhance the ON current

Published by

Japanese Journal of Applied Physics

Summary

journal-article

Simulation study of short-channel effects of tunnel field-effect transistors

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Japanese Journal of Applied Physics

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journal-article

Enhancement of capacitance benefit by drain offset structure in tunnel field-effect transistor circuit speed associated with tunneling probability increase

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Japanese Journal of Applied Physics

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journal-article

Impact of residual defects caused by extension ion implantation in FinFETs on parasitic resistance and its fluctuation

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Solid-State Electronics

Summary

journal-article

Material engineering for silicon tunnel field-effect transistors: isoelectronic trap technology

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Mrs Communications

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journal-article

On the drain bias dependence of long-channel silicon-on-insulator-based tunnel field-effect transistors

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Japanese Journal of Applied Physics

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Structural and electrical characterization of epitaxial Ge thin films on Si(001) formed by sputtering

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Japanese Journal of Applied Physics

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Tunnel FinFET CMOS inverter with very low short-circuit current for ultralow-power Internet of Things application

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Japanese Journal of Applied Physics

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Suppression of tunneling rate fluctuations in tunnel field-effect transistors by enhancing tunneling probability

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Japanese Journal of Applied Physics

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Bias temperature instability in tunnel field-effect transistors

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Japanese Journal of Applied Physics

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journal-article

Epitaxial growth of Ge thin film on Si (001) by DC magnetron sputtering

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Materials Science in Semiconductor Processing

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journal-article

Impact of extension implantation conditions of fin field-effect transistors on gate-induced drain leakage

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Japanese Journal of Applied Physics

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Characterization of Effective Mobility and Its Degradation Mechanism in MoS2 MOSFETs

Published by

Ieee Transactions on Nanotechnology

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Closed-form analytical model of static noise margin for ultra-low voltage eight-transistor tunnel FET static random access memory

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Japanese Journal of Applied Physics

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journal-article

Demonstrating Performance Improvement of Complementary TFET Circuits by ION Enhancement Based on Isoelectronic Trap Technology

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2016 Ieee International Electron Devices Meeting (Iedm)

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book-chapter

Introduction of SiGe/Si heterojunction into novel multilayer tunnel FinFET

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Japanese Journal of Applied Physics

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journal-article

Study of gate leakage current paths in p-channel tunnel field-effect transistor by current separation measurement and device simulation

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Japanese Journal of Applied Physics

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journal-article

Characterization of effective mobility by split C-V technique in MoS2 MOSFETs with high-k/metal gate

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2015 Ieee 15th International Conference on Nanotechnology (Ieee-Nano)

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journal-article

Design guidelines to achieve minimum energy operation for ultra low voltage tunneling FET logic circuits

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Japanese Journal of Applied Physics

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journal-article

Effect of hot implantation on ON-current enhancement utilizing isoelectronic trap in Si-based tunnel field-effect transistors

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Applied Physics Express

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journal-article

Evolution of Nanoscale Silicon CMOS Technology for Ultra Low Power Application

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2015 Ieee International Meeting For Future of Electron Devices, Kansai (Imfedk)

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Fabrication of high-k/metal-gate MoS2 field-effect transistor by device isolation process utilizing Ar-plasma etching

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Japanese Journal of Applied Physics

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Impact of fin length on threshold voltage modulation by back bias for Independent double-gate tunnel fin field-effect transistors

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Solid-State Electronics

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journal-article

Improvement of epitaxial channel quality on heavily arsenic- and boron-doped Si surfaces and impact on performance of tunnel field-effect transistors

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Solid-State Electronics

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Modeling of Parallel Electric Field Tunnel FETs

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18th International Workshop on Computational Electronics (Iwce 2015)

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journal-article

PBTI for N-type Tunnel FinFETs

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2015 International Conference on IC Design & Technology (ICICDT)

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journal-article

Understanding of BTI for Tunnel FETs

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2015 Ieee International Electron Devices Meeting (Iedm)

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journal-article

Robust and Compact Key Generator Using Physically Unclonable Function Based on Logic-Transistor-Compatible Poly-Crystalline-Si Channel FinFET Technology

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2015 Ieee International Electron Devices Meeting (Iedm)

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journal-article

Study of tunneling transport in Si-based tunnel field-effect transistors with ON current enhancement utilizing isoelectronic trap

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Applied Physics Letters

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Heteroepitaxy of GaSb on Si(111) and fabrication of HfO2/GaSb metal-oxide-semiconductor capacitors

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Applied Physics Letters

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journal-article

Accurate Prediction of PBTI Lifetime for N-type Fin-Channel Tunnel FETs

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2014 Ieee International Electron Devices Meeting (Iedm)

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book-chapter

Band-to-Band Tunneling Current Enhancement Utilizing Isoelectronic Trap and its Application to TFETs

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2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers

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book-chapter

Electrical characteristics and thermal stability of HfO2 metal-oxide-semiconductor capacitors fabricated on clean reconstructed GaSb surfaces

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Applied Physics Letters

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journal-article

Experimental Realization of Complementary p- and n- Tunnel FinFETs with Subthreshold Slopes of less than 60 mV/decade and Very Low (pA/mu m) Off-Current on a Si CMOS Platform

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2014 Ieee International Electron Devices Meeting (Iedm)

Summary

book-chapter

High-Performance Tri-Gate Poly-Ge Junction-Less P- and N-MOSFETs Fabricated by Flash Lamp Annealing Process

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2014 Ieee International Electron Devices Meeting (Iedm)

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book-chapter

High-performance poly-Ge short-channel metal-oxide-semiconductor field-effect transistors formed on SiO2 layer by flash lamp annealing

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Applied Physics Express

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journal-article

Improvement of Epitaxial Channel Quality on Heavily Arsenic-and Boron-doped Si surfaces and Impact on Tunnel FET Performance

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Proceedings of the 2014 44th European Solid-State Device Research Conference (Essderc 2014)

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book-chapter

Performance Enhancement of Tunnel Field-Effect Transistors by Synthetic Electric Field Effect

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Ieee Electron Device Letters

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journal-article

Performance evaluation of parallel electric field tunnel field-effect transistor by a distributed-element circuit model

Published by

Solid-State Electronics

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journal-article

Unexpected equivalent-oxide-thickness dependence of the subthreshold swing in tunnel field-effect transistors

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Applied Physics Express

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journal-article

Variation Behavior of Tunnel-FETs Originated from Dopant Concentration at Source Region and Channel Edge Configuration

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Proceedings of the 2014 44th European Solid-State Device Research Conference (Essderc 2014)

Summary

book-chapter

Tunnel Field-Effect Transistor with Epitaxially Grown Tunnel Junction Fabricated by Source/Drain-First and Tunnel-Junction-Last Processes

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Japanese Journal of Applied Physics

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journal-article

A compact model for tunnel field-effect transistors incorporating nonlocal band-to-band tunneling

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Journal of Applied Physics

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journal-article

Analysis of Threshold Voltage Shifts in Double Gate Tunnel FinFETs: Effects of Improved Electrostatics by Gate Dielectrics and Back Gate Effects

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2013 International Symposium on Vlsi Technology, Systems, and Applications

Summary

book-chapter

Guidelines for Symmetric Threshold Voltage in Tunnel FinFETs with Single and Dual Metal Gate Electrodes

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2013 Proceedings of the European Solid-State Device Research Conference (Essderc)

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book-chapter

Performance Limit of Parallel Electric Field Tunnel FET and Improvement by Modified Gate and Channel Configurations

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2013 Proceedings of the European Solid-State Device Research Conference (Essderc)

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journal-article

First Demonstration of Drain Current Enhancement in SOI Tunnel FET with Vertical-Tunnel-Multiplication

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Ieee International Soi Conference

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book-chapter

SiO2/Si interfaces on high-index surfaces: Re-evaluation of trap densities and characterization of bonding structures

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Applied Physics Letters

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Vacuum-ultraviolet reflectance difference spectroscopy for characterizing dielectrics-semiconductor interfaces

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Thin Solid Films

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journal-article

Tunnel Field-Effect Transistors with Extremely Low Off-Current Using Shadowing Effect in Drain Implantation

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Japanese Journal of Applied Physics

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Raman, nuclear magnetic resonance, and transport characteristics of C-13 enriched single-walled carbon nanotubes

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Journal of Nanophotonics

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Formation of single electron transistors in single-walled carbon nanotubes with low energy Ar ion irradiation technique

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Journal of Vacuum Science & Technology B

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High-Temperature Operation of Single-Electron Transistors Based on Single-Walled Carbon Nanotubes

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Sensors and Materials

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journal-article

Barrier formation technique using low energy Ar ion irradiation to form wide temperature range operable SWCNT-SET

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2009 9th Ieee Conference on Nanotechnology

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book

Coupled Quantum Dots in a Graphene-Based Two-Dimensional Semimetal

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Nano Letters

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journal-article

Study of local segregation in GaInNAs using EXAFS measurements

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Journal of Physics and Chemistry of Solids

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journal-article

Charge trapping effects in photovoltage measurements of (Ga,Mn)As

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Physica B-Condensed Matter

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journal-article

Improved temperature characteristics of single-wall carbon nanotube single electron transistors using carboxymethylcellulose dispersant

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Applied Physics Letters

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Optical properties and thermal stability of GaAsN alloy films

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Journal of Luminescence

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Molecular beam epitaxy and magnetic properties of GaMnNAs

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Journal of Crystal Growth

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Magnetic and crystalline properties of GaMnNAs and low-temperature annealing effect

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2006 Conference on Optoelectronic and Microelectronic Materials & Devices

Summary

book

Ordering of In and Ga in epitaxially grown In0.53Ga0.47As films on (001)InP substrates

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Materials Transactions

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journal-article

Experimental demonstration of Fano-type resonance in photoluminescence of ZnS : Mn/SiO2 one-dimensional photonic crystals

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Applied Physics Letters

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GaNAs(001) surface phases under growing condition

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Journal of Vacuum Science & Technology B

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Optical anisotropy and surface morphology of InGaAs lattice-mismatched with GaAS(001)

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Current Applied Physics

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Surface structure of InGaAs/InP(001) ordered alloy during and after growth

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Applied Surface Science

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journal-article

Comparison of the capabilities of rotating-analyzer and rotating-compensator ellipsometers by measurements on a single system

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Thin Solid Films

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journal-article

Optical anisotropy of GaNAs grown on GaAS(001) substrate

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Current Applied Physics

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journal-article

Dielectric functions of InxGa1-xAs alloys

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Physical Review B

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Measurements of a component of the piezo-optic tensor of Si by reflectance difference spectroscopy

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Journal of Applied Physics

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Measurements of the linear electro-optic coefficients of ZnTe by RDS

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Physica Status Solidi B-Basic Research

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journal-article